Sunic System’s Successful Demonstration of 1.1um Shadow Distance, High resolution up to 1500 ppi

Sunic System announced at 2016 IMID Business Forum that it succeeded in implementing 1.1um shadow distance by using plane source evaporation and 100um shadow mask. 1.1um shadow distance is able to manufacture 1000ppi~1500ppi high resolution.

Plane source evaporation is a technology to evaporate OLED light-emitting material on metal plate, invert it, apply heat to the metal plate, and vertically evaporate OLED light-emitting material. When the shadow angle(Ф) of OLED light-emitting material evaporation is 90 degrees, the value of SD(Shadow distance, step height / tanФ) is zero (0) theoretically. So, it is possible to design thick and high resolution FMM, which means high-resolution AMOLED panel can be manufactured. This principle was announced for the first time at IMID 2016 Business Forum, attracting big attention.

Sunic System Dr. Hwang Chang-hoon said “If we lower step height up to 3um by reducing the thickness of shadow mask based on this result, 0.37um shadow distance would be possible, which means we can manufacture maximum 2250ppi(11K) high resolution AMOLED panel. Accordingly, we will put spurs to development of 0.37 shadow distance”.

Also, he announced that co-evaporation of host and dopant that had been thought to be impossible in plane source has been resolved using flashing evaporation. He also proved that if donor film goes through flashing evaporation after co-evaporation of host and dopant, host and dopant can co-evaporate, and color control becomes easier by controlling dopant ratio to manufacture donor film.


<Result of Color Control after applying Flashing Evaporation>


<Result of 1.1um Shadow Distance>